Figure 14.

Results on etched squares in Si (6 μm wide, 2.5 um deep) measured with a ×20 water immersion Linnik system (NA = 0.5, λ_eff = 450 nm, working distance of 3.5 mm) and an aggregate layer of 1 g/L alumina measured with a ×40 water immersion Linnik system (NA = 0.8, λ_eff = 450 nm). (a) & (d) height images, (c) & (f) line profiles from (a) & (d), and (b) & (e) 3D images.⁹ Reproduced with permission from H. Mukhtar, P. Montgomery, F. Anstotz, R. Barillon, A. Rubin Immersion white light scanning interferometry using elastic polymer path length compensation. Proceedings of SPIE Photonics Europe, Optical Micro- and Nanometrology VII; 2018; Vol. 10678.⁹