Fig. 4.

(a) The heating curves of different samples were continuously exposed under an 808 nm laser for 20 min; (b) The heating curves of CN/M0.2 with various concentrations were continuously exposed to an 808 nm laser for 20 min; (c) The heating curves of different samples exposed to Xe lamp for 20 min; (d) The heating curves of CN/M0.2 with different concentrations exposed to Xe lamp for 20 min continuously; (e) The O₂ generation of different samples exposed to Xe lamp for 20 min; (f) Real-time infrared thermal images of different samples exposed to continuous irradiation; (g) The photothermal cycling curves of CN/M0.2 exposed to the dual light. (* represents p < 0.05, ** represents p < 0.01).