| AFM | atomic force microscopy |
| BB | beam blur |
| CAFM | conductive atomic force microscopy |
| primary electron energy | |
| EBC | electron beam curing |
| ET | exposure time |
| FEBID | focused electron beam induced deposition |
| FIB | focused ion beam |
| FSE | forward scattered electron |
| GIS | gas injection system |
| beam current | |
| HAADF | high-angular-annual-darkfield |
| MFM | magnetic force microscopy |
| SEM | scanning electron microscopy |
| SPM | scanning probe microscopy |
| SS-CL | self-sensing cantilever |
| TET | total exposure time |
| TEM | transmission electron microscopy |
| VGR | volume growth rate |
| EDX | energy dispersive X-ray spectroscopy |
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