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. 2023 May 31;9:71. doi: 10.1038/s41378-023-00530-2

Table 2.

Comparison of stability of various passivation methods

Passivation method No passivation HSQ Only PVD SiO2 PVD SiO2 /Si3N4 PMMA SU8 Low temp. HSQ/Si3N4 High temp. HSQ/Si3N4
Thickness (nm) N/A 300 50 600 200 1000 650 440
Tfail <1 min <1 min <1 min <10 min <10 min <10 min 4 h 39 h