Table 2.
Methods and conditions of etching
| MAX Phase | Etching solution and condition | Resulting product | Characteristic | Reference |
|---|---|---|---|---|
| Ti3AlC2 powder | 50%HF, room temperature, 2 h | Ti3C2 | High toxicity | [23] |
| Ti3AlC2 powder |
30%HF, room temperature, 5 h 10%HF, room temperature, 18 h 5%HF, room temperature, 24 h |
Ti3C2Tx | Low toxicity | [31] |
| Ti3AlC2 powder | 1 M NH4HF2, 60℃,8 h | Ti3C2 | Non-toxic, monolayer MXene | [30, 35] |
| Ti3AlC2 powder | LiF + 6 M HCl, 35℃,24 h | Ti3C2Tx | Non-toxic, monolayer MXene | [24] |
| Ti3AlC2 powder |
LiF + 9 M HCl, room temperature,24 h |
Ti3C2Tx | Non-toxic, monolayer MXene | [31] |
| Ti3AlC2 powder | ZnCl2, 550℃ | Ti2CCl2 Ti3C2Cl2 | Non-toxic, Need not MAX Phase | [36] |
|
Zr3Al3C5 powder (not MAXphase) |
50%HF, room temperature | Zr3C2 | Non-toxic, Need not MAX Phase | [37] |