Table 1. Concentrations of PS Particle Dispersions and Residual Styrene Concentration at Varying PS Contents in Cell Culture^a.

nomenclature	PS (μg/mL)	styrene (%)	PS (%)	residual styrene at varying PS (μg/mL)
				300	500	1000	1900
MIP	27,400	0.875	99.13	2.65	4.41	8.82	16.77
MIPA	30,500	0.214	99.79b	0.64	1.07	2.14	4.07
MHP	17,300	0.030	99.97	0.09	0.15	0.30	0.56
MHPA	21,030	0.038	99.96b	0.11	0.19	0.38	0.71
S0			86.7
SIP	19,360	0.572	99.43	1.73	2.88	5.75	10.93
SIPA	20,780	0.235	99.77b	0.71	1.18	2.35	4.47
SHP	15,510	0.028	99.97	0.08	0.14	0.28	0.53
SHPA	17,260	0.043	99.96b	0.13	0.22	0.43	0.83

^aCalculated final styrene concentration for PS particle dispersions at PS concentrations of 300, 500, 1000, and 1900 μg/mL.

^bThe purity of the autoclaved dispersions changed. This can be ascribed to the overall outcome of the evaporation and condensation of water and styrene (boiling point 145 °C, density 0.91 g/mL) in the glass vial during the autoclaving process (121 °C). Purity refers to the percentage of the PS mass accounting for the total mass of PS and styrene in the dispersions. MIP, standard PS model particle dispersion as received; MIPA, autoclaved MIP; MHP, rapidly dialyzed MIP against methanol/water (50/50) mixed solvents; MHPA, autoclaved MHP; S0, in-house synthesized PS particle dispersion without purification; SIP, S0 dialyzed against water for 40 days; SIPA, autoclaved SIP; SHP, rapidly dialyzed SIP against methanol/water (50/50) mixed solvents; SHPA, autoclaved SHP.