Figure 9.
Photograph under UV light of (a) unprotected SQW in acidic conditions; (b) silica overcoated SQW in acidic conditions; (c) evaluation of the PLQY of the SQW protected with silica in acidic conditions (the un-protected samples are practically not luminescent); TEM images of the SQW/SiO2 (d) without acid etching (shell thickness 17 nm) and SQW/SiO2 etched for 48 h with (e) HCl, (f) HNO3 (g) H2SO4 (Reprinted with permission from [65]).