Table 1. Summary of Reported Nucleation Delay for Ru PE-ALD in the Literature^a.

references	substrates	metal precursor	plasma type	temperature K	nucleation delay
Swerts et al.29	TiN/Si wafer	(MeCpPy)Ru	N2/H2 or N2/NH3	323	<10 ALD cycles
	TiN/Si wafer	Ru(EtCp)2	N2/H2	323	∼120 ALD cycles
	TiN/Si wafer	Ru(EtCp)2	N2/NH3	323	>500 ALD cycles
Swerts et al.35	SiO2	(MeCpPy)Ru	N2/NH3	603	∼120 ALD cycles
	TiN/Si wafer	(MeCpPy)Ru	N2/NH3	603	∼50 ALD cycles
Xie et al.30	TaN/Si wafer	Ru(EtCp)2	NH3	543	∼50 ALD cycles
Kwon et al.36	TiN/Si wafer	Ru(EtCp)2	NH3	543	<10 ALD cycles

^aNo data of nucleation delay for Co PE-ALD in the literation was found.