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. 1999 Oct;181(19):6152–6159. doi: 10.1128/jb.181.19.6152-6159.1999

FIG. 6.

FIG. 6

FIG. 6

Resistance to heat and acid in exponential and stationary phase. (A) 50°C heat shock. (B) pH 4 shock. (C) 5 mM H2O2. See Materials and Methods for details. Circles, Tn5 control (strain SGC125). Squares, skgA::Tn5 (strain SGC127). Open symbols, exponential phase (OD600 of 0.36 to 0.76). Filled symbols, stationary phase (20 h later). In panel C (5 mM H2O2), no CFU were seen for either exponential culture at time points beyond 1 h.