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Deposition conditions of HfO2 thin films.
| MS Type | Target–Substrate Distance (cm) |
Time of Powering Break (s) | Sputtering Time (min) | Power (W) | Sputtering Pressure (mbar) | Oxygen Flow (sccm) |
|---|---|---|---|---|---|---|
| sequential | 8 | 1 | 180 | 450 | 1.2 × 10−2 | 18 |
| 12 | 360 | |||||
| continuous | 8 | - | 90 | |||
| 12 | 180 |
