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. 2023 Jul 20;23(14):6556. doi: 10.3390/s23146556

Table 3.

The comparison of the performances of the three technical means.

Response Reflection
(90 Degree)
Reflection
(<90 Degree)
Stability Batch Fabrication Cost
Ultrathin InP buffer layer medium high high high no medium
Antireflection film deposition high low medium low yes high
Mie scattering AR nanostructure integration high low low high yes medium