Table 3.
The comparison of the performances of the three technical means.
Response | Reflection (90 Degree) |
Reflection (<90 Degree) |
Stability | Batch Fabrication | Cost | |
---|---|---|---|---|---|---|
Ultrathin InP buffer layer | medium | high | high | high | no | medium |
Antireflection film deposition | high | low | medium | low | yes | high |
Mie scattering AR nanostructure integration | high | low | low | high | yes | medium |