Table 3.

Detailed performance analysis of the sensor for different RI using AZO as plasmonic material.

RI	AS (RIU−1)		Amp. Res. (RIU) ($\times$ 10−6)		WS(nm/RIU)		Wav. Res. (RIU) ($\times$ 10−6)		FWHM		FOM
	x pol.	y pol.	x pol.	y pol.	x pol.	y pol.	x pol.	y pol.	x pol.	y pol.	x pol.	y pol
1.19	620.6	644.1	16.1	15.5	500	500	200	200	4.15	4.21	120	118
1.20	656.1	679.6	15.2	14.7	500	500	200	200	4.44	4.24	113	118
1.21	715.2	698.3	14.0	14.3	500	600	200	167	4.24	4.46	118	134
1.22	753.1	729.4	13.3	13.7	600	600	167	167	4.54	4.46	132	134
1.23	797.6	788.9	12.5	12.7	600	600	167	167	4.61	4.64	130	129
1.24	834.2	830.6	12.0	12.0	700	700	143	143	4.81	4.76	145	147
1.25	889.7	868.1	11.2	11.5	700	700	143	143	4.94	5.00	142	140
1.26	919.2	947.4	10.9	10.6	800	700	125	143	5.12	5.13	156	136
1.27	993	981.8	10.1	10.2	800	900	125	111	5.32	5.42	150	166
1.28	1020	1050	9.8	9.53	900	900	111	111	5.31	5.56	169	161
1.29	1125	1136	8.89	8.80	900	900	111	111	5.67	5.86	158	153
1.30	1203	1206	8.31	8.29	1100	1100	90.9	90.9	6.11	12.51	179	87
1.31	1263	1265	7.92	7.90	1200	1200	83.3	83.3	6.39	6.37	187	188
1.32	1363	1362	7.33	7.34	1200	1300	83.3	76.9	6.87	6.80	175	191
1.33	1444	1465	6.93	6.82	1500	1400	66.7	71.4	7.30	7.32	205	191
1.34	1550	1575	6.45	6.35	1600	1600	62.5	62.5	7.84	7.74	204	206
1.35	1676	1687	5.97	5.93	1800	1800	55.6	55.6	8.48	8.38	212	214
1.36	1805	1813	5.54	5.52	2100	2100	47.6	47.6	9.17	9.23	229	227
1.37	1966	1990	5.09	5.02	2400	2600	41.7	38.5	10.24	10.28	234	252
1.38	2217	2105	4.51	4.75	3000	2900	33.3	34.5	11.50	11.49	261	252
1.39	2175	2456	4.60	4.07	3700	3800	27.0	26.3	13.19	13.39	280	284
1.40	2819	2851	3.55	3.51	5100	5200	19.6	19.2	15.84	15.85	322	328
1.41	3593	3763	2.78	2.66	8500	9100	11.8	11.0	20.56	20.65	413	441
1.42	–	–	–	–	–	–	–	–	–	–	–	–