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. 2023 Aug 15;16(16):5638. doi: 10.3390/ma16165638
ALD Atomic Layer Deposition
T-ALD Thermal-ALD
PE-ALD Plasma Enanched-ALD
NIOTs Near Interface Oxide Traps
MOSFET Metal Oxide Semiconductor Field Effect Transistor
MOS Metal Oxide Semiconductor
IL Interlayer
High-κ High permittivity (κ) dielectrics
TEM Transmission Electron Microscopy
AFM Atomic Force Microscopy
SCM Scanning Capacitance Microscopy