Table 2.
Material | Sensitivity (mV/pH) | Deposition | Correlation Coefficient | Substrate | Ref. |
---|---|---|---|---|---|
PPY | 48 | Electrodeposition | 0.997 | Pt | [36] |
PPPD | 34 | Electrodeposition | 0.995 | Pt | [36] |
PANI | 52 | Electrodeposition | 0.957 | Pt | [36] |
IrO2 | 69.9 ± 2.2 | Electrodeposition | 0.997 | polyimide | [37] |
WO3 NP | 56.7 ± 1.3 | Electrodeposition | 0.995 | polyimide | [38] |
TiO2 | 59 | Reactive sputtering | 0.998 | SiO2/p-Si | [39] |
Si3N4 | 49.7 | LPCVD | 0.997 | Si wafer | [40] |
PANI | 74.2 ± 2.2 | Electrodeposition | 0.992 | FTO | This work |
PANI | 61.9 ± 2.7 | Spin-coating | 0.987 | FTO | This work |