Figure 1.
(a) Schematic illustration of the continuous laser pyrolysis (CLP) process. (b) Optical microscope images of the serpentine pattern written by LPDW technology before and after cleaning treatment. (c) Comparison data on microchannel width and depth prepared by LPDW technology at different focal distances (vss = 10 mm/s, Pavg = 1.5 W, and fpr = 40 kHz). (d) Critical realization conditions distribution heatmap for CLP reaction (ddef = −6 mm). (e) Critical reaction boundary fitting curve of CLP reaction under different fpr and Pavg. (f) Comparison of microchannel aspect ratio and cross-sectional morphology under different numbers of laser scans.