Table 1.

Surface treatment using laser texturing.

Ref.	Material	Treatment Method	Angle
[14]	Silicon	Femtosecond laser texturing (pulse width of 30 fs; wavelength 800 nm; frequency 1 kHz; scanning speed 3 mm/s), layer of fluoroalkylsilane	θ = 160°
[15]	Aluminum alloy	Nanosecond laser texturing (pulse width of 50 ns; peak power of 0.95 mJ; frequency 20 kHz; scanning speed 50 mm/s) and chemisorption	θ ≈ 170° roll off angles 2.1°
[79]	Aluminum alloy	Nanosecond laser texturing (pulse duration 120 ns; pulse frequency, 40 kHz; laser output power 100 W; laser beam velocity 1000 mm/s; scanning density 150 lines/mm; peak fluence 140 J/cm2) and fluorosilane deposition	θ = 171.5 ± 0.8° roll off angles 2.0 ± 0.6°
[26]	Copper and polydimethylsiloxane	Femtosecond laser texturing (laser fluence 4–100 J/cm2; wavelength 800 nm; frequency 1 kHz; scanning speed 15 mm/s)	θ = 165° roll off angles < 5°
[78]	Tungsten	Nanosecond laser texturing (scanning speed 500 mm/s; scanning line density 25 mm−1; number of laser passes 5; effective fluence 715 J/cm2)	θ = 172.2 ± 0.5° roll off angles 3.5 ± 1.2°
[80]	Stainless steel	Nanosecond laser texturing (pulse duration 50 ns; pulse frequency 20 kHz; peak pulse power 0.95 mJ; linear rate 50 mm/s; scanning density 150 lines per mm) and chemisorption of a hydrophobic agent CF3(CF2)6(CH2)O(CH2)2C(OCH3)3	Liquid—polydimethylsiloxane θ = 165 ± 2° roll off angles 3 ± 1°
[81]	Stainless steel AISI 316L	Nanosecond laser texturing (pulse width of 100 ns; peak power of 1 MJ; frequency 200 kHz; scanning speed 200 mm/min) and silanization	θ ≈ 153.2°
[82]	Polydimethylsiloxane	Femtosecond laser texturing (pulse width of 50 fs; wavelength 800 nm; frequency 1 kHz; scanning speed 5 mm/s, power 40 MW) followed by oxygen plasma treatment	After laser treatment θ = 155.5° ± 1.5° After treatment with oxygen plasma θ = 4.5° ± 0.5°