Figure 4.

Depiction of routinely employed plasma sources for the modification or the synthesis of polymer films. (a) Low-pressure reactor supplied with DC voltage; (b) Low-pressure reactor supplied with DC pulsed voltage; (c) Dielectric barrier device (DBD) operating in ambient air; (d) DBD operating in a low-pressure reactor supplied in monomer vapor by a bubbler; (e) Capacitively coupled plasma (CCP) device supplied with RF voltage; (f) Diagram correlating the position of the ionic sheaths and the plasma region with the axial profile of the RF voltage for maximum (+), minimum (−) and average values; (g) Dual frequency CCP; (h) Inductively coupled plasma (ICP) device; (i) Microwave plasma device; (j) Piezoelectric plasma device with Rosen-type transformer.