Table 9.

Different types of precursors utilized in PECVD: a categorized compilation.

Precursors	Categories	Examples
Monomers	Vinyl monomers (Carbon-carbon double bond, C=C)	Methyl methacrylate [113]; styrene [262]; 2-methyl-1,3-butadiene (isoprene) [263]; Vinyltriethoxysilane [264]
	Aromatic monomers	Pyrrole [265]; Thiophene [266]; Aniline [267]
	Acrylate monomers	1H,1H,2H,2H-perfluorododecyl acrylate (PFDA) [268]; Dodecylacrylate (DOCA) [268]; Lauryl methacrylate (LMA) [269]
	Fluorinated monomers (Carbon-fluorine bonds)	Perfluorinated alkenes, e.g., tetrafluoroethylene (TFE) [270]; Hexafluoropropylene oxide (HFPO) [271]; Hexafluoropropene (HFP) [272]; Perfluorooctyl ethylene [273]; 1H,1H,2H,2H-perfluorooctyl acrylate (PFOA) [274]; Hexafluoroethane (C2F6) [275]
	Biocompatible monomers	Allylamine [66,276]; glycidyl methacrylate [242]; acrylic acid [262,277,278]; 2-hydroxyethyl methacrylate (HEMA) [279]
Non-monomers	Metal-organic compounds	-Metal alkoxides, e.g., titanium isopropoxide [250] for titanium dioxide polymerization or tetraethylorthosilicate for silicon dioxide deposition [280] -Metalorganic complexes, e.g., trimethylaluminum [281] for aluminum oxide thin films or ferrocene for nanostructured hematite thin films [282]
	Inorganic compounds	-Metal halides, e.g., SiCl4 [283] for silicon deposition -Metal hydrides, e.g., diborane [284] for boron depositions
	Organosilicon compounds	-Trimethylsilyl acetate [127] -Silanes especially tetramethylsilane (TMS) [285], hexamethyldisilazane (HMDSN) [286] -Siloxanes especially hexamethyldisiloxane (HMDSO) [287] and octamethylcyclotetrasiloxane (OMCTS) [288]
	Large organic molecules or oligomers	-Perfluorocarbon precursors, e.g., perfluorohexane (PFH, C6F14) [289], perfluorodecalin (PFD, C10F18) [290], perfluoroheptane (PFHp, C7F16) [291] -Ethylene glycol [292], tetra(ethylene glycol) dimethyl ether [293]; Diethylene glycol vinyl ether [294], Diethylene glycol monomethyl ether [295]; ε-caprolactone [295]; Perfluorodecyl acrylate [294]