Table 2. Photoelectrochemical Performances of Literature Benchmark CuWO₄ Photoanodes Prepared with Different Synthetic Approaches.

			Jg	stability
synthetic method	electrolyte	thickness/nm	/ mA cm–2	Time / min	Jfinh / mA cm-2–2jfinh	ref
spin-coating	0.1 M KPi (pH 7)	580	0.37	120	0.37	this work
one step-hya	0.2 M KPi (pH 7)e	∼1500	0.38	50	0.3	(43)
ST – hyb	0.1 M KPi (pH 7)	≥1000	∼0.3	60	∼5%i	(44)
ST – hy	0.1 M KPi (pH 7)	≥1000	0.34	240	∼35%i	(45)
ST – hy	1 M KBi (pH 9)f	≥1000	0.4	60	0.39	(29)
ST – hy	0.1 M KPi (pH 7)	2000	0.42	n/a	n/a	(46)
ST – hy	0.1 M KPi (pH 7)	≥1000	0.35	240	0.26	(47)
spin-coating	KPi (pH 7)	500	0.47	600	0.4	(48)
e-depositionc	0.1 M KPi (pH 7)	2–3000	0.18	600	∼50%i	(25)
ALDd	1 M KBi (pH 9.0)	80	∼0.15	n/a	n/a	(41)
ST - hy	0.1 M Kpi (pH 7)	≥1000	0.35	60	∼17%i	(22)
spin coating	0.1 M Na2SO4 (pH 6.8)	800	0.27	2.5	0.21	(49)
spray pyrolysis	0.1 M KPi (pH 7)	1.5–2000	0.19	n/a	n/a	(50)
spin coating	KPi/NaCl 0.1/0.14 M	250	0.38	n/a	n/a	(51)
ST – hy	0.1 M KPi (pH 7)	≥1000	0.38	240	0.39	(52)

^aone-step hydrothermal.

^bsacrificial template–hydrothermal.

^celectrodeposition.

^datomic layer deposition.

^epotassium phosphate buffer.

^fpotassium borate buffer.

^gcurrent density at 1.23 V_SHE,

^hcurrent density at 1.23 V_SHE at the end of the stability test,

ⁱcurrent density percent drop at the end of the stability test (in this case the stability is at a voltage ≥1.23 V_SHE).