Table 11.
Process parameters for hermetic passivation of BSK-glass for electronic device via PVD.
| Process | Material | Parameters |
|---|---|---|
| Evaporation plant | BSK | 250 Å, 2 Å/s, Power 24,5 %, |
Process parameters for hermetic passivation of BSK-glass for electronic device via PVD.
| Process | Material | Parameters |
|---|---|---|
| Evaporation plant | BSK | 250 Å, 2 Å/s, Power 24,5 %, |