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. 2023 Oct 21;23:504. doi: 10.1186/s12870-023-04509-z

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© The Author(s) 2023

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/. The Creative Commons Public Domain Dedication waiver (http://creativecommons.org/publicdomain/zero/1.0/) applies to the data made available in this article, unless otherwise stated in a credit line to the data.

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Fig. 6 — Effects of SiO₂-NPs on actual photochemical efficiency of photosystem II (Φ_PSII, A), photochemical quenching of variable chlorophyll (qP, B), non-photochemical quenching (NPQ, C), and maximal photochemical efficiency of photosystem II (Fv/Fm, D) of cotton seedlings under the salt and low temperature dual stress. CK represents the foliar application of 0 mg L^− 1 SiO₂-NPs with no stress. T1, T2, T3, and T4 represent the foliar application of 0 mg L^− 1, 50 mg L^− 1, 100 mg L^− 1, and 200 mg L^− 1 SiO₂-NPs under the salt and low-temperature dual stress, respectively. Data are mean ± standard deviation (n = 3). Different alphabets on top of error bars represent significant differences (p < 0.05)