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. 2023 Oct 18;19:1580–1603. doi: 10.3762/bjoc.19.116

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Copyright © 2023, Wang et al.

This is an open access article licensed under the terms of the Beilstein-Institut Open Access License Agreement (https://www.beilstein-journals.org/bjoc/terms/terms), which is identical to the Creative Commons Attribution 4.0 International License (https://creativecommons.org/licenses/by/4.0). The reuse of material under this license requires that the author(s), source and license are credited. Third-party material in this article could be subject to other licenses (typically indicated in the credit line), and in this case, users are required to obtain permission from the license holder to reuse the material.

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Scheme 20 — Depolymerization mechanism of common photoresists. (a) A possible mechanism of radiation decomposition of poly(methyl methacrylate). (b) A proposed mechanism of simultaneous radical/cationic decomposition of poly(olefin sulfone) upon radiation [197].