. 2023 Nov 15;15(47):55139–55149. doi: 10.1021/acsami.3c13269

Table 1. XPS Ratios of the Hal 2p (or 3d) over Si 2p Electron Signals Were Corrected by the Atomic Sensitivity Factors on Hal(H)–Si(100) and Hal(OH)–Si(100) Substrates after the Halogenation Reaction with N-Hal-succinimides^a.

halogenating agents	NCS (Cl)	NBS (Br)	NIS (I)
	XPS signal ratios of Hal 2p (or 3d)/Si 2p electrons
H–Si(100)	0.028	0.017	0.012
OH–Si(100)	0.010	0.005	0.003
	OH–Si/H–Si halogenation selectivity
	1:2.8	1:3.5	1:4

Halogenation selectivity of N-Hal-succinimides.

Table 1. XPS Ratios of the Hal 2p (or 3d) over Si 2p Electron Signals Were Corrected by the Atomic Sensitivity Factors on Hal(H)–Si(100) and Hal(OH)–Si(100) Substrates after the Halogenation Reaction with N-Hal-succinimidesa.