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High-temperature XRD patterns of Cu(Ag) alloy films with 1.25% Ag obtained at different temperatures where: (a) the peak at 43.2° corresponds to Cu(111) and the one at 69.25° corresponds to Si(100) from the substrate; (b) zoomed-in view of the Cu (222) XRD peak at 95° showing a systematic shift in the Cu(222) peak towards lower angles with increasing temperature.
