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. 2023 Dec 6;14:1178–1199. doi: 10.3762/bjnano.14.98

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Copyright © 2023, Bilgilisoy et al.

This is an open access article licensed under the terms of the Beilstein-Institut Open Access License Agreement (https://www.beilstein-journals.org/bjnano/terms/terms), which is identical to the Creative Commons Attribution 4.0 International License (https://creativecommons.org/licenses/by/4.0). The reuse of material under this license requires that the author(s), source and license are credited. Third-party material in this article could be subject to other licenses (typically indicated in the credit line), and in this case, users are required to obtain permission from the license holder to reuse the material.

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(a) An SEM image of FEBID structures deposited on SiO₂ from [Au(CH₃)₂Cl]₂ with an electron dose of 7.80 C/cm² using a 5 keV electron beam and different beam currents of 0.4 nA, 1.5 nA, and 3 nA. (b) Magnified images of FEBID structures from (a). (c) An AES plot of the FEBID structures deposited with 0.4 pA, 1.5 nA, and 3 nA depicted with blue, green, and purple lines, respectively.