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. 2023 Dec 6;14:1178–1199. doi: 10.3762/bjnano.14.98

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Copyright © 2023, Bilgilisoy et al.

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(a) An SEM image of a 4 × 4 µm² FEBID structure deposited on Si(111) from [Au(CH₃)₂Cl]₂ with an electron dose of 7.80 C/cm² using the electron beam parameters of 5 keV and 1.5 nA. (b) An AES plot of the Si(111) substrate prior to deposition (black line) and the result from the FEBID structure (red line). The red-colored star in (a) indicates the position where the spectrum was acquired.