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. 1998 Jun;180(11):2987–2991. doi: 10.1128/jb.180.11.2987-2991.1998

TABLE 2.

Organic solvent tolerance of P. aeruginosa on agar plates

Strain Relevant efflux phenotypeb Growth ona:
n-Hexane p-Xylene Toluene
PAO1 MexAB-OprM+ + (S) + (S)
K1119 MexAB-OprM
OCR1 MexAB-OprM++c + (C) + (C)
ML5087 MexAB-OprM+ + (S) + (S)
K1110 MexAB+ OprM
K1112d MexAB-OprM++ + (C) + (C)
K1131 MexAB-OprM MexCD-OprJ+
K1117 MexAB-OprM MexEF-OprN+
PAO6609 MexAB-OprM+ + +
K1032 MexAB-OprM
a

Bacteria (5 μl) were spotted onto LB agar, overlaid with organic solvent, and incubated overnight at 30°C as outlined in the text. +, growth; −, no growth. In parentheses are the results of EOP experiments in which 100-μl cell cultures were plated on the surfaces of LB agar plates, overlaid with organic solvent, and likewise incubated overnight. C, confluent growth; S, single-colony growth. The log Pow values of the solvents were as follows: n-hexane, 3.9; p-xylene, 3.1; toluene, 2.8. 

b

The status of those efflux systems (components) that are known to be expressed and, thus, potentially contribute to the organic solvent tolerance of the indicated strains is highlighted. 

c

High-level expression of MexAB-OprM. 

d

This strain yielded scattered colonies after 72 h of incubation in the presence of toluene.