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. 2024 Jan 4;14(1):127. doi: 10.3390/nano14010127

Figure 12.

Figure 12

(a) Contact angle test results of polishing solutions containing different polyamines with silicon wafers treated with hydrofluoric acid. (b) The proportion of N atoms that can adsorb to the silicon surface with the same N contents of the adsorption layer in the multimolecular adsorption simulation.