Skip to main content
. 2024 Mar 8;14(12):8081–8089. doi: 10.1039/d4ra00572d

Comparison of optimal preparation conditions for devices based on J71 : TTz3(R) blends.

Active layer D/A ratio Solvent Total concentration DIO Rotating speed Thickness
J71 : TTz3(C6C8) 1 : 2 Chloroform 15 mg mL−1 0.25% 3000 rpm 100 nm
J71 : TTz3(C4C6) 1 : 2 Chloroform 12 mg mL−1 0.25% 2500 rpm 100 nm
J71 : TTz3(C2C4) 1 : 2 Chloroform 7.2 mg mL−1 0.25% 1500 rpm 65 nm