Comparison of optimal preparation conditions for devices based on J71 : TTz3(R) blends.
| Active layer | D/A ratio | Solvent | Total concentration | DIO | Rotating speed | Thickness |
|---|---|---|---|---|---|---|
| J71 : TTz3(C6C8) | 1 : 2 | Chloroform | 15 mg mL−1 | 0.25% | 3000 rpm | 100 nm |
| J71 : TTz3(C4C6) | 1 : 2 | Chloroform | 12 mg mL−1 | 0.25% | 2500 rpm | 100 nm |
| J71 : TTz3(C2C4) | 1 : 2 | Chloroform | 7.2 mg mL−1 | 0.25% | 1500 rpm | 65 nm |