Table 2.
Comparison of adhesion measurement methods of 2D materials
| Measurement method | Dominant fracture mode | Lateral resolution | Accuracy | Sample preparation effort | Measurement effort |
|---|---|---|---|---|---|
| blister test10,16 | mixed mode | nm-µm | high | high | high |
| nanoparticles17,19 | mixed mode | nm-µm | high | moderate | high |
| scratch testing36,38 | mixed mode | µm | moderate | moderate | low |
| four-point bending42 | mixed-mode | mm | moderate | moderate | low |
| nanoindentation24,25 | mode I | nm | high | low | high |
| cantilever beam method33,34 | mode I | mm | moderate | moderate | low |
| micro force sensing during cleavage27 | mode II | µm | high | moderate | high |
| AFM friction measurement23 | mode II | nm | low | low | high |
| substrate stretching on flexible substrates29–31 | mode II | µm | moderate | low | moderate |
| button shear testing on rigid substrates this work | mode II | µm | moderate | moderate | low |
The button shear test method provides viable measurements in fracture mode II with low to moderate effort on rigid substrates like silicon.