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. 2024 Mar 27;14:7326. doi: 10.1038/s41598-024-57248-y

Table 2.

Experimentally extracted loss tangents of qubit elements.

Process tanδpads(×104) tanδleads(×104) tanδSQUID(×104)
Lift-off 11.9±3.1 9.4±4.4 4.1±1.5
Wet etch 7.9±3.7

Loss tangents extracted using SLE process for the qubit elements by the leads patterning process. The extracted offset relaxation rate Γ0 is 204±63s-1.