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| conductive
diamond layer |
p-Si substrate |
||||
|---|---|---|---|---|---|
| commercial reference | boron content (ppm) | sp3/sp2 ratio | BDD layer thickness (μm) | Si resistivity (mΩ·cm) | Si surface roughness (μm) |
| WD 908–5 | 2500 | 68 | 1.15 | 100 | <0.1 |
