Fig. 3. SEM images for e-beam patterns of photoresists 2–3 under PAB (80 °C, 60 s), no PEB, initial thickness: 21 nm, developer: 2-heptanone, 60 s. Cluster 2 refers to the 12-tin cluster (X = BF4), and cluster 2′ refers to the cluster with X = OH.
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