TABLE 2.

Organic solvent resistance levels of acrAB and tolC mutants

Straina	Plasmid	IPTG (1 mM)	Growth on agar overlaid withb:
			Decane (5.98)	Nonane (5.45)	Octane (4.93)	Heptane (4.40)	n-Hexane (3.87)	Cyclohexane (3.35)
JA300	pMW219	−	100	100	100	100	50	—
		+	100	100	100	100	50	—
	pLKAcrAB	−	100	100	100	100	40	—
		+	100	100	100	100	100	—
	pLTolC	−	100	100	100	100	30	—
		+	100	100	100	100	30	—
JA300T	pMW219	−	100	—	—	—	—	—
		+	100	—	—	—	—	—
	pLKAcrAB	−	100	—	—	—	—	—
		+	100	—	—	—	—	—
	pLTolC	−	100	100	100	100	50	—
		+	100	100	100	100	50	—
JA300A	pMW219	−	100	50	—	—	—	—
		+	100	50	—	—	—	—
	pLKAcrAB	−	100	100	100	50	0.01	—
		+	100	100	100	100	30	—
	pLTolC	−	100	0.01	—	—	—	—
		+	100	—	—	—	—	—
JA300TA	pMW219	−	100	—	—	—	—	—
		+	100	—	—	—	—	—
	pLKAcrAB	−	100	—	—	—	—	—
		+	100	—	—	—	—	—
	pLTolC	−	100	0.01	—	—	—	—
		+	100	—	—	—	—	—
	pLKAcrAB + pLTolC	−	100	100	100	20	0.005	—
		+	100	100	100	100	30	—

^aEach strain carrying the plasmid was grown in LBGMg medium. Cells in the exponential phase of growth were plated on LBGMg agar. The agar was overlaid with the test solvent and incubated at 37°C overnight. 

^bThe log P_OW value of each solvent is shown in parentheses. The solvent resistance is represented by the frequency of colony formation, with that observed in the absence of any solvent taken as 100%. —, below 0.001%.