Table 3.

Comparative analysis of calibration methods: Coefficient of determination ( $R^2$ ) and temperature errors.

References	Method	CMOS Technology	${\mathit{R}}^2$	Max Positive Error (°C)|Corresponding Temp. (°C)	Max Negative Error (°C)|Corresponding Temp. (°C)
This Work	Uncalibrated	Xfab180 nm	−0.736	+48.12|+81.5	N/A|N/A
This Work	2nd Degree Polynomial Fit	Xfab180 nm	0.9975	+2.59|+42	−3.33|+81.5
This Work	3-Point Calibration	Xfab180 nm	0.9956	+1.70|+72	−3.29|+10
This Work	2-Point Calibration	Xfab180 nm	0.9958	+1.56|−15	−3.13|+10
This Work	Linear Fit	Xfab180 nm	0.9364	+0.57|−18	−11.30|+37
This Work	1-Point Calibration	Xfab180 nm	0.9808	+5.94|−18	−11.50|+81.5
This Work	Corrected 1-Point Calibration	Xfab180 nm	0.9957	+2.95|+72	−2.66|+10
[11]	Ring oscillator: Trimming 1-point	TSCM65 nm	N/A	+3.00|100	−3.00|+20
[12]	Ring oscillator: Trimming 2-point	TSCM65 nm	N/A	+2.60|+80	−3.40|+60
[18]	ROTS: Trimming 2-point	TSMC180 nm	N/A	+2.00|−25	−1.60|+25
[17]	Delay Line: Trimming 2-point	TSCM65 nm	N/A	+1.00|0	−0.80|+35