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. 2024 May 25;17(11):2552. doi: 10.3390/ma17112552
MEMS Micro-Electromechanical Systems
DUV Deep Ultraviolet
EUV Extreme Ultraviolet
CARs Chemically Amplified Resists
n-CARs Non-Chemically Amplified Resists
LER Line Edge Roughness
LWR Line Width Roughness
PMMA Poly(methyl methacrylate)
DNQ Diazonaphthoquinone
DFP Dry Film Photoresist
PCB Printed Circuit Board