Figure 6.

Projection integrations of GISAXS scattering images for 7.14 nm Fe₂O₃ nanocrystal monolayer films deposited onto silicon substrates at various nanocrystal surface coverage with the X-ray beam oriented both perpendicular (A) and parallel (B) to the substrate retrieval direction. (C) Plot of the edge-to-edge spacing vs. surface coverage for nanocrystal films transferred to silicon substrates with the X-ray beam (■) perpendicular and (♦) parallel to the dipping direction. For comparison, the edge-to-edge spacing for nanocrystals compressed at the (▲) air–water interface is also plotted.