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. 2024 Aug 27;15:7387. doi: 10.1038/s41467-024-51479-3

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© This is a U.S. Government work and not under copyright protection in the US; foreign copyright protection may apply 2024

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Fig. 2 — a Resistivity vs. temperature for the superconducting La_0.78Ca_0.22NiO₂ and La_0.8Sr_0.2NiO₂ samples, showing a clear transition and large RRR. b XRR depth profiles of the as-grown and superconducting films, specifically the real component of the scattering length density (SLD). c Intensity vs. mass-to-charge ratio near the H⁻ peak for an as-grown La_0.78Ca_0.22NiO₃ and superconducting La_0.78Ca_0.22NiO₂ film, integrated over the entire measurement time. d Raw intensity (counts) of the H⁻ peak in the substrate region for the same as-grown La_0.78Ca_0.22NiO₃ and superconducting La_0.78Ca_0.22NiO₂. e SIMS depth profile of superconducting La_0.78Ca_0.22NiO₂. f SIMS depth profile of superconducting La_0.8Sr_0.2NiO₂. Note that the La_0.8Sr_0.2NiO₂ film was sputtered at a lower ion beam energy than the La_0.78Ca_0.22NiO₂ due to the thinner cap layer.