Figure 20.
Coating deposition process in a single pulse stage: (a) High-level stage of the previous pulse; (b) Low-level stage of the previous pulse; (c) Rising stage of the next pulse; (d) High-level stage of the next pulse [87].
Coating deposition process in a single pulse stage: (a) High-level stage of the previous pulse; (b) Low-level stage of the previous pulse; (c) Rising stage of the next pulse; (d) High-level stage of the next pulse [87].