Figure 3.

Bacterial growth dynamics upon repeated phage/antiseptic exposures. (A) Scheme indicating the overall workflow of three subsequent exposures in liquid cultures with either antiseptic or phage alone or both combined (e.g. bacteria that were exposed to the antiseptic/phage combination were subsequently exposed to the phage alone and again with the combination). P. aeruginosa strain PZ (B and D) was challenged with 12.5 µg/ml of polyhexanide or octenidine, respectively, +/- phage NP3. S. aureus strain SA1 (C and E) was challenged with 1.25 µg/ml of polyhexanide or octenidine, respectively, +/- phage Sb-1. The phage MOI was 0.1. All experiments were performed as three independent biological replicates, with the mean bacterial density (OD_600nm) displayed. Bars indicate SD.