Table 2.

– Few water splitting electrocatalysts prepared using binder-less fabrication techniques.

Material	Binder-less Fabrication Method	Electrolyte	Overpotential (unit - mV, at 10 mA/cm2 or unless mentioned otherwise)	Tafel Slope (unit – mV/dec)	Reference
CuO-Cu2O Nanowires//Cu Foam	Chemical oxidation of a Cu foam with NaOH and (NH4)2S2O, followed by annealing	1 M KOH	HER -135 OER – 315	HER - 135 OER – 63	[47]
Ni3Se3//Cu Foam	Electrodepostion from a bath of Ni(OCOCH3)2. 4H2O, SeO2, LiCl	1 M KOH	HER – 100 OER – 340 (at 50 mA/cm2)	HER – 98 OER – 60	[48]
NiCoP@Cu3P//Cu Foam	Direct oxidation of Cu Foam	1 M KOH	HER – 54 OER – 309	HER – 72 OER - 42	[49]
Ni-Fe-Co nanocones	Electrodeposition in a bath mixture of Ni, Fe and Co chlorides at a varying current density in 2-step process	1 M KOH	HER – 91 OER – 316	HER -86 OER - 43	[50]
NiOx - Fe	Atomic Layer Deposition, followed by electrodeposition	1 M KOH	OER: −480 mV (Saturated Fe electrolyte) −500 mV (Trace Fe electrolyte)	OER – 30	[75]
NiCo and NiFe on Cu Foams	Electrodeposition, in a bath of Ni, Co, Fe salts	1 M KOH	NiCo (HER) −86 mV NiFe (OER) −206 mV	HER - 62.1 mv/dec 43.5 mv/dec	[68]
RuCo Alloy on Ni Foam	Chemical Vapor Deposition (Aerosol-Assisted)	1 M KOH	HER – 17 mV (for 10 mA/cm2) 100 mV (for 100 mA/cm2)	HER – 40 mV/dec	[58]
Graphene Oxide @ Ni Foam	Chemical Vapor Deposition	1 M H2SO4	HER – 83.2 mV	HER – 55.7 mV/dec	[59]
VOx-30 @ Ni Foam	Chemical Vapor Deposition (Aerosol-Assisted)	1 M KOH	OER – 290 mV (for 10 mA/cm2) −470 (for 1000 mA/cm2)	OER – 68 mV/dec	[60]
Co-Fe-LDH Nanosheets (Co0.5Fe0.5 – LDH optimized)	Pulsed Laser Ablation (aqueous medium)	1 M KOH	OER – 270 mV	OER – 115.7 mV	[93]
Various Co-based electrocatalysts	Pulses Laser Ablation in Liquid	1 M KOH	OER - 230 mV (for Co3(PO4)2) HER – 361 mV (for Co9S8)	OER – 48.5 mV (HER - 95.8 mV	[85]