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. 2024 Aug 31;15(9):1122. doi: 10.3390/mi15091122

Figure 1.

Figure 1

(a) Lithography technology advancement from 1970 to 2020. (b) DUV and EUV lithography comparison [6]. (c) Photochemical reactions of EUV photoresist (reprinted with permission from ref. [5], 2023, Elsevier). (d) Definitions of line edge roughness and line width roughness (reprinted with permission from ref. [7], 2016, Elsevier). (e) Absorption coefficient of different metal oxide photoresists at EUV as compared to traditional CAR (reprinted with permission from ref. [8], 2002, SPIE).