Skip to main content
. 2024 Oct 1;14:22767. doi: 10.1038/s41598-024-69853-y

Table 2.

The comparison table of the evaluated β and n2 values of the present study and previous reports on other oxide and NiO.

Sample β (cm W-1) n2 (cm2 W-1) Parameters References
Ni-doped ZnO thin film 2.80-4.28× 10-7 4.04-4.78× 10-11 λ=750 nm 42
170 nm thick ITO thin film 9.0× 10-12 λ=820 nm 43
As deposited NiO films 9.4-8.8× 10-7 λ=632.8 nm 14
250 °C annealed NiO films 2.3-3.3× 10-5 λ=632.8 nm 14
NiO microrods 3.5× 10-9 λ=532 nm 44
NiO-PVA composite film 1.30-3.39× 10-6 λ=532 nm 45
Undoped NiO films 0.92× 10-5 2.2× 10-12 λ=532 nm 16
N-doped (20% Ar, 80% N2) NiO films 4.55× 10-5 6.5× 10-12 λ=532 nm 16
Undoped NiO films 9.01× 10-2 8.36× 10-9 λ=632.8 nm 21
15% N in NiO films 5.32× 10-2 6.35× 10-7 λ=632.8 nm 21
NiO films 6.60× 10-7 0.2× 10-10 λ=800 nm 17
Pristine NiO -6.66× 10-6 2.68× 10-10 λ=1030 nm This work
300 °C annealed 9.23× 10-6 1.99× 10-10 λ=1030 nm This work
350 °C annealed 9.86× 10-6 1.64× 10-10 λ=1030 nm This work
400 °C annealed 19.08× 10-6 4.21× 10-10 λ=1030 nm This work
450 °C annealed 17.08× 10-6 4.11× 10-10 λ=1030 nm This work
500 °C annealed 0.89× 10-6 0.92× 10-10 λ=1030 nm This work