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XPS spectra of the TiAlC surface before and after N2/H2 plasma treatment for elements (a) Ti 2p, (b) Al 2p, (c) C 1s, and (d) N 1s. Excitation power: 300 W, bias power: 200 W, N2/H2 ratio: 50/50, working pressure: 2 Pa, and substrate temperature: 20 °C.
