Fig. 4. Fabrication of patterned and wafer-scale polymer brushes by CuBr-mediated SI-CRP. Optical micrographs (a) and the AFM image (b) of the strip-patterned POEGMA brushes. Optical micrographs (c) and the AFM image (d) of the positive grid-patterned PSPMA brushes on the 4-inch wafer (polymerization time for 60 min, PMDETA 10 μL, D = 0.49 mm). (f) The thickness of PSPMA brushes measured by ellipsometry along radial lines corresponding to the color line in (e).
