Table 1.
Air exposure | O2 plasma | UV‐ozone | Annealing | AFM/laser | |
---|---|---|---|---|---|
Cost | Low | High | Middle | Low | High |
Throughput | Slow | Fast | Fast | Middle | Slow |
Precision | Low | High | High | Low | High |
Strength | Mild | Strong | Strong | Strong | Medium |
Self‐limiting | Low | High | High | Low | Low |