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. 2024 Nov 23;14:29052. doi: 10.1038/s41598-024-78971-6

Fig. 1.

Fig. 1

Schematic representation of typical three-cavity MDPC device designed by stacking three-layer microcavity with alternating Ag and \documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$\hbox {Alq}_{3}$$\end{document} layers. (a) and (b) represent the schematics of MDPCs with the defect introduced in a dielectric (\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$\hbox {Alq}_{3}$$\end{document}) layer of center and edge cavity respectively. All mirrors are 20 nm thick and the thickness of standard or static organic layer is 350 nm. Defect percentages were varied from -98% to +100% (\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$0.02\le r \le 2$$\end{document}) of standard size (350 nm) with the step of 1%. Inset shows the schematic of a single unit cell which is defined as a single microcavity. (c) Cross-sectional SEM image of an \documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$N = 3$$\end{document} MDPC device with \documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$r = 1.50$$\end{document} in center cavity, taken at a \documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$45^{\circ }$$\end{document} angle using secondary electron detector, prepared by focused ion beam.