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. 2024 Nov 20;14(22):1852. doi: 10.3390/nano14221852

Figure 1.

Figure 1

(a) Lithography process flowchart. (b) Fabrication of the SERS substrate: Si substrate patterned with inverted pyramid pits, MoO3 deposition, sulfurization to MoS2, and Cu electrode deposition. (c) SERS measurement setup: Cu electrodes are connected to a Keithley 2400 source meter to apply a longitudinal electric field for R6G localization.