Figure 3.

Preparation method of memristor based on ALD

(A) ALD growth process of the MoS₂ film.⁵⁵ Copyright © 2023, Royal Society of Chemistry.

(B) Pt-nanoparticle incorporated HfAlO_x alloy memristor conductance modulation characteristics.⁵⁶ Copyright © 2021, AIP Publishing.

(C) The 3D neural network of synaptic units.⁵⁷ Copyright © 2020, American Chemical Society.

(D) Low temperature ALD process based oxide (HfAlO_x) devices.

(E) The ability of multibit data storage.⁵⁸ Copyright © 2020, John Wiley & Sons Australia.