Figure 9.

Optimization strategy based on memristor by material modification and reconstruction

(A) The HF etching and reflux process of Ti₃AlC₂ to Ti₃C₂T_x.¹³⁴ Copyright © 2023, Wiley-VCH GmbH.

(B) Schematic of device fabrication process flow.¹³⁵ Copyright © 2022, Elsevier B.V. All rights reserved.

(C) Structural of the the planar ReS₂-based memristor.³⁰ Copyright © 2021, Springer Nature.

(D) The sponge-like double layer porous oxide memristor.¹³⁶ Copyright © 2021, Springer Nature.

(E) The p-SF film structure and fabrication process analysis.¹³⁷ Copyright © 2021, American Chemical Society.